| Session 1:
Annual SID Business Meeting |
Tuesday, May 24, 2004 / 8:00 - 8:30 am / Ballrooms A/B
|
| Session 2:
Keynote Session / Display of the Year Awards |
|
Tuesday, May 24 / 8:30 - 10:30 am / Ballrooms A/B |
|
2.1: |
Keynote Address
1:
LCD Revolution -- The 3rd Wave
Sang Wan Lee, President and CEO, Samsung Electronics Co., Ltd., LCD
Business, Kyunggi-do, Korea |
|
2.2: |
Keynote Address
2: A Global Perspective on the Future of
Mobile Displays for Use in Cellular Telephones, Televisions, and a
Growing Number of Emerging Applications
Harold Hoskens, Senior Vice-President and General Manager, Philips Mobile
Display Systems, San Jose, CA, U.S.A. |
|
2.3: |
Keynote Address 3: From
the Shadows to Center Stage: The Emergence of Electronics as the
Dominant Arena for Display Innovation
Jean-Louis Bories, Senior Vice President and General Manager, Displays and
Wireless Group, National Semiconductor Corp., Santa Clara, CA, U.S.A.
|
| Session 3:
Flexible Active-Matrix Displays |
|
Tuesday, May 24 / 10:50 am - 12:30 pm / Ballroom A |
|
3.1: |
Invited Paper:
Rollable QVGA Active-Matrix Displays Based on Organic
Electronics
G. Gelinck, Polymer Vision / Philips Research Laboratories, Eindhoven, The
Netherlands |
|
3.2: |
Invited Paper: High-Performance OTFTs on Flexible Substrate
J. Jang, Kyung Hee University, Seoul, Korea |
|
3.3: |
Large-Area Full-Color Transmissive a-Si TFT-LCD Using Low-Temperature
Processes on Plastic Substrates
M. Hong, Samsung Electronics Co., Kyunggi-do, Korea |
|
3.4: |
Flexible Active-Matrix Displays
S. Burns, Plastic Logic, Ltd., Cambridge, UK |
|
3.5: |
Invited Paper: Recent Progress in Large-Sized High-Performance
Organic TFT Arrays
M. Hong, Samsung Electronics Co., Kyunggi-do, Korea
|
| Session 4:
White OLEDs |
|
Tuesday, May 24 / 10:50 am - 12:00 pm / Ballroom C |
|
4.1: |
Invited Paper: Large-Area White OLEDs
A. Duggal, GE Corporate R&D, Schenectady, NY, USA
|
|
4.2: |
Highly Efficient Top-Emitting White Organic EL Devices
S-F. Hsu, National Chiao Tung University, Hsinchu, Taiwan, R.O.C. |
|
4.3: |
Lifetime
and Power Enhanced RGBW Displays based on White OLEDs
J. Spindler, Eastman Kodak Co., Rochester, NY, USA |
|
4.4L: |
Late-News Paper: Novel Top-Emitting OLEDs for Full-Color Displays
with Highest Power Efficiencies
J. Birnstock, Novaled GmbH, Dresden, Germany
|
| Session 5:
Measurement and Modeling |
|
Tuesday, May 24 / 10:50 am - 12:10 pm / Room 302 |
|
5.1: |
Characterization of Inhomogeneous Retarders
M. Becker, Display-Metrology & Systems, Karlsruhe, Germany |
|
5.2: |
New Technique for Measuring the Jones Matrix of a Polarization Medium
at Oblique Light Incidence
Y. Saitoh, Fuji Photo Film, Kanagawa, Japan |
|
5.3: |
Determination of LC Polar-Anchoring Energy by Electrical Measurement
A. Muravsky, Institute Of
Applied Physics Problems, Minsk, Belarus |
|
5.4: |
Advanced Tools for Modeling of 2-D Optics of LCDs
V. Chigrinov, Hong Kong University of Science & Technology, Clear
Water Bay, Hong Kong
|
| Session 6:
LCD Manufacturing: Considerations and Simulations |
|
Tuesday, May 24 / 10:50 am - 12:30 pm /Room 304 |
|
6.1: |
Roll-to-Roll Manufacturing Considerations for Flexible Cholesteric
LCD Media
G. Mccollough, Eastman Kodak Co., Rochester, NY, USA |
|
6.2: |
Layer-Thickness Simulation for Static Thin-Film Deposition on Gen
6/Gen 7 Substrates
A.. Lopp, Applied Films GmbH & Co., Alzenau, Germany |
|
6.3: |
Impact of CVD Film Deposition on Pitch Change
S. Hoysan, Corning Incorporated, Corning, NY, USA |
|
6.4: |
Effects on Seal Material Resulting from a Pre-Assembly Temperature
Difference between the TFT and CF Substrate
S. Hoysan, Corning Incorporated, Corning, NY, USA |
|
6.5: |
Mechanical Integrity of Total LCD Panel
S. Gulati, Corning Incorporated, Corning, NY, USA
|
| Session 7:
3-D and Novel Technologies |
|
Tuesday, May 24 /10:50 am - 12:30 pm / Room 311 |
|
7.1: |
Invited Paper:
True 3-D Display Technology
B. Schowengerdt, University of Washington, Seattle, WA, USA |
|
7.2: |
A Turn-Type Color 3-D Display System Using LEDs
Y. Sakamoto, Kanazawa Institute of Technology, Ishikawa, Japan |
|
7.3: |
Autostereoscopic Swing 3-D Display
H. Nam, Samsung SDI, Kyunggi-do, Korea |
|
7.4: |
Design of 2-D/3-D Switchable Displays
W. Ijzerman, Philips Research Laboratories, Eindhoven, The Netherlands |
|
7.5: |
Invited Paper:
FogScreen: An Immaterial Interactive Screen
I. Rakkolainer, FogScreen, Inc., Santa Barbara, CA, USA
|
| Session 8:
Inorganic EL |
|
Tuesday, May 24 /10:50 am - 12:10 pm / Room 312 |
|
8.1: |
Invited Paper:
TDEL: Technology Evolution in Inorgnic
Electroluminescence
X. Wu, iFire Technology Corp., Toronto, Ontario, Canada |
|
8.2: |
Sphere-Supported TFEL Technology
A. Kitai, McMaster University, Hamilton, Ontario, Canada |
|
8.3: |
Flexible IR-Emitting ZnS:ErF3 ACTFEL Devices
N. Shepherd, U.S. Army Research Laboratory, Adelphi, MD, USA |
|
8.4: |
Blue-Emitting Barium Thioaluminate Phosphors by Sputtering of
Composite Targets
A. Kosyachkov, iFire Technology Corp., Toronto, Ontario, Canada
|
| Session 9:
High-Image-Quality AMLCDs |
|
Tuesday, May 24 / 2:00 - 3:10 pm / Ballroom A |
|
9.1: |
Dynamic Burn-In Prevention for LCDs with Large-Area Flicker
Cancellation
W. Furtner, SP3D Chip Design GmbH, Starnberg, Germany |
|
9.2: |
A New Driving Method to Compensate for Row Line-Signal Propagation
Delays in an AMLCD
R. McCartney, National Semiconductor Corp., Santa Clara, CA, USA |
|
9.3: |
A 32-in. WXGA LCD TV Using OCB Mode, LTPS TFTs, and
Blinking-Backlight Technology
K. Nishiyama, Toshiba Matsushita Display Technology Co., Ltd., Ishikawa,
Japan |
|
9.4L: |
Late-News Paper: Color Filter on TFT Array Structure Which Does Not
Use Photolithography Process in Upper Substrate and Organic Insulator in TFT Substrate
J-J. Park, LG.Philips LCD, Kyunggi-do, Korea
|
| Session 10:
OLED Device Structures |
|
Tuesday, May 24 / 2:00 - 3:10 pm / Ballroom C |
|
10.1: |
Broadband-Emitting Microcavity OLED Devices
Y-S. Tyan, Eastman Kodak Co., Rochester, NY, USA |
|
10.2: |
Invited Paper: Examining Microcavity OLEDs Having Two Metal Mirrors
C-C. Wu, National Taiwan University, Taipei, Taiwan, R.O.C. |
|
10.3: |
MOVED
TO POSTER SESSION (OLEDs, P.185) |
|
10.4: |
High-Performance and Innovative OLED Structures
C. Prat, Thomson R&D France, Cesson Sevigne, France |
|
10.5L: |
Late-News Paper: High-Efficiency and High-Operational-Stability
Top-Emitting OLEDs
H. Murakami, Hitachi Materials Research Laboratory, Ibaraki, Japan
|
| Session 11:
LCD Systems |
|
Tuesday, May 24 / 2:00 - 3:00 pm/ Room 302 |
|
11.1: |
Invited Paper: Ferroelectric Liquid Crystals as a Material for
Volumetric Displays
I. Kompanets, Lebedev Physical Institute of RAS, Moscow, Russia |
|
11.2: |
High-Contrast Wide-Viewing-Angle LCD Light Filter
J. Pirs, Josef Stefan Institute, Ljubljana, Slovenia |
|
11.3: |
Wavelets for Displaying Gray Shades in LCDs
T. Ruckmongathan, Raman Research Institute, Bangalore, India
|
| Session 12:
Display Materials in Manufacturing |
|
Tuesday, May 24 / 2:00 - 3:00 pm / Room 304 |
|
12.1: |
A New Durable Soil-Resistant Optical Film for Front-Surface
Protection of FPDs
W. Coggio, 3M Co., St. Paul, MN, USA |
|
12.2: |
Characterization of Dryers for OLED/PLED Applications
P. Battilana, SAES Getters S.p.A., Lainate, Italy |
|
12.3: |
UV-Curable Barrier Sealants
D. Herr, National Starch & Chemical Co., Bridgewater, NJ, USA
|
| Session 13:
Medical Displays |
|
Tuesday, May 24 / 2:00 - 3:10 pm / Room 311 |
|
13.1: |
Invited Paper: Medical Imaging and the Performance of Softcopy
Displays
H. Roehrig, University of Arizona, Tucson, AZ, USA |
|
13.2: |
Viewing-Angle
Comparison of IPS and VA Medical AMLCDs
A. Badano, CDRH/FDA, Rockville, MD, USA |
|
13.3: |
MTF and NPS Study of High-Resolution LCDs and CRTs for Mammography
E. Samei, Duke
University/Fischer Imaging Corp., Denver, CO, USA |
|
13.4: |
MOVED
TO POSTER SESSION (Applications, P.186) |
|
13.5L: |
Late-News Paper:
Super High Performance of a 20.8-in. Medical
Monitor Using True-Black Advanced FFS
S. H. Park, BOE HYDIS Technology Co., Ltd., Kyunggi-do, Korea
|
| Session 14:
Plasma-Display Structures |
|
Tuesday, May 24 / 2:00 - 3:20 pm / Room 312 |
|
14.1: |
Invited Paper:
Development of Plasma-Tube-Array Technology for
Extra-Large-Area Displays
K. Awamoto, Fujitsu Laboratories, Ltd., Askashi, Japan |
|
14.2: |
Discharge Characteristics of a New Structure ACPDP Using Thick-Film
Ceramic Sheet Technology
N. Kikuchi, Noritake Co., Ltd., Fukuoka, Japan |
|
14.3: |
A 25-in. SMPDP with Fine Pitch and High Resolution
Y. Tang, Southeast University, Nanjing, China |
|
14.4: |
Plasma-Display Panel with Ridged Dielectric Layer between Sustaining
Electrodes
S-H. Son, Samsung Advanced Institute of Technology, Suwon, Korea
|
| Session 15:
Amorphous-Silicon AMLCDs with Integrated Drivers |
|
Wednesday, May 25 / 9:00 - 10:20 am / Ballroom A |
|
15.1: |
High-Resolution Integrated a-Si Row Driver Circuits
C. H. Kim, BOE HYDIS Tehnology Co., Ltd., Ichon, Korea |
|
15.2: |
A 2.0-in. a-Si:H TFT-LCD with Low-Noise Integrated Gate-Driver
Circuit
J. Jang, Kyung Hee University, Seoul, Korea |
|
15.3: |
Reliable Integrated a-Si Gate Driver for 2.2-in. QVGA
TFT-LCD
W-C. Wang, Wintek Corp., Taiwan, R.O.C. |
|
15.4: |
Invited Paper: Design of Integrated Drivers with a-Si TFTs for Small
Displays: Basic Concepts
T. Kretz, THALES Avionics LCD, Moirans, France
|
| Session 16:
OLED Displays I |
|
Wednesday, May 25 / 9:00 - 10:20 am / Ballroom C |
|
16.1: |
Invited Paper: An Alternative Approach for Large-Sized AMOLEDs
H-K. Chung, Samsung SDI, Yongin, Korea |
|
16.2: |
Distinguished
Paper: Development of 1.5-in. Full-Color Double-Sided AMOLED with Novel
Array Design
C-W. Ko, AU Optronics Corp., Hsinchu, Taiwan, R.O.C. |
|
16.3: |
Interactive Passive-Matrix Polymer-OLED Display
A. Sempel, Philips Research Laboratories, Eindhoven, The Netherlands |
|
16.4: |
A 14.1-in. WXGA Polymer-LED Display with a-Si TFTs
A. Saafir, Samsung Electronics, Kyunggi-do, Korea |
|
16.5L: |
Late-News Paper:
Non-Contact OLED Color Patterning by
Radiation-Induced Sublimation Transfer (RIST)
M. Boroson, Eastman Kodak Co., Rochester, NY, USA
|
| Session 17:
Wide-Viewing-Angle LCDs I |
|
Wednesday, May 25 / 9:00 - 10:00 am / Room 302 |
|
17.1: |
Invited Paper: Recent Advancements and Future Possibilities of IPS
TFT-LCDs
K. Kondo, Hitachi, Ltd., Ibaraki, Japan |
|
17.2: |
Improved PVA Mode with High Transmittance and Aperture Ratio
C-S. Lee, Sanayi System Co., Ltd., Incheon, Korea
|
|
17.3: |
OCB-WV Film for Fast-Response-Time and Wide-Viewing-Angle LCD TVs
Y. Ito, Fuji Photo Film Co., Ltd., Kanagawa, Japan
|
| Session 18:
Backlights I |
|
Wednesday, May 25 / 9:00 - 10:20 am / Room 304 |
|
18.1: |
Adaptive Dimming Technique with Optically Isolated Lamp Groups
T. Shiga, The University of Electro-Communications, Tokyo, Japan |
|
18.2: |
Architectural Choices in a Scanning Backlight for Large LCD TVs
A. A. S. Sluyterman, Philips Lighting B.V., Eindhoven, The Netherlands |
|
18.3: |
Life Aspects of HCFL Light Sources in LCD-Backlighting Applications
H. Gielen, Philips Lighting B.V., Roosendaal, The Netherlands |
|
18.4: |
Low-Fill-Factor Wire-Grid Polarizers for LCD Backlighting
X-D. Mi, Eastman Kodak Co., Rochester, NY, USA
|
| Session 19:
Motion-Blur Characterization |
|
Wednesday, May 25 / 9:00 - 10:20 am / Room 311 |
|
19.1: |
LCD Visual Quality Analysis by Moving-Picture Simulation
T-W. Su, AU Optronics Corp., Hsinchu, Taiwan |
|
19.2: |
Evaluation of Motion Artifacts and Evolving Compensation Techniques
for LCD Monitors
J. Miseli, Sun Microsystems, Menlo Park, CA, USA |
|
19.3: |
Correlation between Perceived Motion Blur and MPRT Measurement
J. Someya, Mitsubishi Electric Corp., Kyoto, Japan |
|
19.4: |
Generalization of Parameters Representing Magnitudes of Motion
Artifacts
K. Oka, Otsuka Elctronics Co., Ltd., Shiga, Japan
|
| Session 20:
Plasma-Display Discharge |
|
Wednesday, May 25 / 9:00 - 10:00 am / Room 312 |
|
20.1: |
Micro-Discharge Arrays for High-Resolution PDPs
S-O. Kim, National Chiao Tung University, Hsinchu, Taiwan, R.O.C. |
|
20.2: |
Dependence of the Discharge Characteristics and Efficacy on the Base
Vacuum Level for PDPs Made Using an In-Vacuum Sealing-Pumping System
S. J. Kwon, Kyungwon University, Kyunggi-do, Korea |
|
20.3: |
Experimental Study on Temperature-Dependent Characteristics of
Temporal Dark Boundary Image Sticking in 42-in. ACPDPs
J. W. Han, Kyungpook National University, Daegu, Korea
|
| Session 21:
Poly-Si Circuit Integration I |
|
Wednesday, May 25 / 10:40 - 11:50 am / Ballroom A |
|
21.1: |
Common-Decoder Architecture for Compact and Power-Saving Poly-Si
Data-Driver Circuits
H. Kageyama, Hitachi, Ltd., Tokyo, Japan |
|
21.2: |
A Low-Voltage P-Type Poly-Si Integrated Driving Circuit for
Active-Matrix Displays
W-J. Nam, Seoul National University, Seoul, Korea |
|
21.3: |
An Improved Dynamic Ratio Less-Shift-Register Circuit Suitable for
LTPS TFT-LCD Panels
T. Miyazawa, Hitachi Displays, Ltd., Mobara, Japan |
|
21.4L: |
Late-News Paper:
A Touch-Panel Function Integrated LCD Including
LTPS A/D Converter
T. Nakamura, Toshiba Matsushita Display Technologies, Saitama, Japan
|
| Session 22:
Phosphorescent OLEDs |
|
Wednesday, May 25 / 10:40 am - 12:00 pm / Ballroom C |
|
22.1: |
Invited Paper:
Phosphorescent Approaches to Achieving
High-Efficiency Monochromatic and White Electroluminescence
M. Thompson, University of Southern California, Los Angeles, CA, USA |
|
22.2: |
Novel Triplet Host Materials: High-Performance Made Easy
H. Becker, Covion Organic Semiconductors GmbH, Frankfurt, Germany |
|
22.3: |
High-Efficiency Electrophosphorescent OLEDs Using Semitransparent Ag
As the Anode
H. Peng, Hong Kong University of Science & Technology, Clear Water
Bay, Hong Kong |
|
22.4: |
Progress of Red-Phosphorescent Dendrimer OLEDs
J. Pillow, CDT Oxford, Ltd., Cambridge, UK
|
| Session 23:
LC Alignment |
|
Wednesday, May 25 / 10:40 am - 12:00 pm / Room 302 |
|
23.1: |
Ink-Jet Printing of Linearly Photopolymerizable Polymer As Alignment
in LCDs
L. Wang, Dalarna University/Swedish LCD Center, Borlange, Sweden |
|
23.2: |
High Pretilt Angles by Nano-Structured Surfaces and Their
Applications
F. Yeung, Hong Kong University of Science & Technolgy, Clear Water
Bay, Hong Kong |
|
23.3: |
A Novel Mono-Domain Alignment Method for FLCs Applied to
Half-V-Shape-Mode Field-Sequential-Color Displays
M. Okabe, Dai Nippon Printing Co., Ltd., Chiba, Japan |
|
23.4: |
Characteristics and Reliabilities of the Ion-Beam-Irradiated
Polyimide As an LC Alignment Layer
J. G. You, BOE TFT-LCD SBU, Gyeonggi-do, Korea
|
| Session 24:
Display Drive Technology and Integration |
|
Wednesday, May 25 / 10:40 am - 12:00 pm / Room 304 |
|
24.1: |
A Programmable Analog Reference Memory for Adaptive Gamma Curve
Correction
T. Blyth, Alta Analog, Inc., Campbell, CA, USA |
|
24.2: |
A 10-bit Source Driver with Resistor-Resistor-String
Digital-to-Analog Converter
Y-C. Sung, Magnachip Semiconductor, Seoul, Korea |
|
24.3: |
Distinguished
Paper: Line Drive Technology: An Advanced TERES with the Integration of
High-Voltage Sustain and Scan Circuits into ICs
S. Tomio, Fujitsu Hitachi Plasma Display, Ltd., Kawasak, Japan |
|
24.4: |
A 510-kB SOG DRAM for Frame-Memory-Integrated Displays
Hiroshi Haga, NEC Corp., Kanagawa, Japan
|
| Session 25:
Spatial and Temporal Color |
|
Wednesday, May 25 / 10:40 am - 12:10 pm / Room 311 |
|
25.1: |
Distinguished
Paper: STColor: Hybrid Spatial-Temporal Color Synthesis for Enhanced
Display Image Quality
L. D. Silverstein, VCD Sciences, Inc., Scottsdale, AZ, USA |
|
25.2: |
A Wide-Gamut-Color High-Aperture-Ratio Mobile Spectrum Sequential
LCD
S. Roosendaal, Philips Research Laboratories, Eindhoven, The Netherlands |
| 25.3: |
Spectrum Sequential LCD
M. Jak, Philips Research Laboratories, Eindhoven, The Netherlands |
|
25.4: |
Six-Primary-Color 23-in. WXGA LCD Using Six-Color LEDs
H. Sugiura, Mitsubishi Electric Corp., Nagaokakyo, Japan
|
| Session 26:
Plasma-Display Efficiency |
|
Wednesday, May 25 / 10:40 am - 12:00 pm / Room 312 |
|
26.1: |
Invited Paper: The Effect of Cell Geometry and Plasma Loss on the
Luminous Efficiency in ACPDPs
T. J. Kim, Seoul National University, Seoul, Korea |
|
26.2: |
A New Structure and Driving Scheme for High Luminous Efficacy in
WXGA PDPs
J-Y. Kim, Samsung SDI, Yongin, Korea |
|
26.3: |
A New Driving Waveform for Improving Luminance and Luminous
Efficiency of ACPDPs with Large Sustain Gap under High Xe Content
B-G. Cho, Kyungpook National University, Daegu, Korea |
|
26.4: |
Invited Paper: Recent Development of Blue Phosphors for PDP
Application
S. Zhang, Daiden Co., Ltd., Miyaki, Japan
|
| Session 27:
Poly-Si Circuit
Integration II |
| Wednesday, May 25 / 3:30 -
4:30 pm / Ballroom A |
|
27.1: |
Novel Structures of Storage and Submicron LDD in CMOS Panels
J-Y. Yang, LG.Philips R&D Center, Kyunggi-do, Korea |
|
27.2: |
Characterizations of Flash Memory on Glass Using LTPS TFT with an
Ultra-Low-Roughness Poly-Si/SiO2 Interface
H-T. Chen, ERSO/ITRI, Hsinchu, Taiwan, R.O.C. |
|
27.3: |
e-Skin IT Device
C-H. Liou, ERSO/ITRI, Hsinchu, Taiwan, R.O.C.
|
| Session 28:
Wide-Viewing-Angle LCDs II |
|
Wednesday, May 25 / 3:30 - 4:30 pm / Ballroom C |
|
28.1: |
Optically Compensated IPS LCD for TV Applications
D. Kajita, Hitachi Materials Research Laboratory, Ibaraki, Japan |
|
28.2: |
Super-Wide-View In-Plane-Switching LCD with Positive and Negative
Uniaxial A-Film Compensation
X. Zhu, University of Central Florida, Orlando, FL, USA |
|
28.3: |
Multidomain Vertically Aligned Nematic LCDs Using Switchable Pixel
Walls
A. Nieuwkerk, Philips Research Laboratories, Eindhoven, The Netherlands
|
| Session 29:
LC-Based Microdisplays |
|
Wednesday, May 25 / 3:30 - 4:50 pm / Room 302 |
|
29.1: |
Unified Study of Twisted-Nematic Reflective Modes for LCoS
J. Xue, Sheridian Corp, Vancouver, WA, USA |
|
29.2: |
Reflective Polarization-Independent LC Phase Modulator with Polymer
Wall
Y. Zhang, Liquid Crystal Institute, Kent State University, Kent, OH, USA |
|
29.3: |
A 1450-ppi Field-Sequential System-on-Glass LCD Capable of Operating
Over a Wide Temperature Range
K. Takatori, NEC Corp., Sagamihara, Japan |
|
29.4: |
Invited Paper: LCoS Microdisplay Manufacturing Issues: Wafers and
Glass
S. Worthington, Hana Microdisplay Technologies, Inc., Twinsburg, OH, USA
|
| Session 30:
OLED
Manufacuring: Printing |
|
Wednesday, May 25 / 3:30 - 4:50 pm / Room 304 |
|
30.1: |
New Nozzle-Printing Method for Large-Sized Organic EL Device
M. Masuchi, Dai Nippon Screen Manufacturing Co., Ltd., Kyoto, Japan |
|
30.2: |
Flexible OLEDs with Gravure Printing and Its Application
H. Nakajima, Dai Nippon Printing Co., Ltd., Chiba, Japan |
|
30.3: |
Gen 7 FPD Ink-Jet Equipment
D. Albertalli, Litrex Corp., Pleasanton, CA, USA |
|
30.4: |
Verticle In-Line Deposition Technology for Full-Color OLED
Production
U. Hoffman, Applied Films GmbH & Co., Alzenau, Germany
|
| Session 31:
Novel Displays |
|
Wednesday, May 25 / 3:30 - 5:10 pm / Room 311 |
|
31.1: |
Development of Six-Primary-Color LCDs
Y-C. Yang, Samsung Electronics Co., Ltd., Kyunggi-do, Korea |
|
31.2: |
A5-Sized Electronic-Paper Display for Document Viewing
H. Gates, E-Ink Corp., Cambridge, MA, USA |
|
31.3: |
Viewing-Angle-Controllable LCD Using Variable Optical Compensator
and Variable Diffuser
Y. Hisatake, Toshiba Corp., Saitama, Japan |
|
31.4: |
Low-Cost Display-Based Photonic Touch Interface with Advanced
Functionality
D. Tulbert, STRIKE Technologies, Inc., Newmarket, Canada |
|
31.5: |
Development of a Combined Liquid Crystal and Fine-Pitch Light-Source
Display
N. Koma, Sanyo Epson Imaging Devices Corp., Gifu, Japan
|
| Session 32:
MgO for Plasma Displays |
|
Wednesday, May 25 / 3:30 - 5:00 pm / Room 312 |
|
32.1: |
Correlation between Wall Charge of a MgO Film and Discharge Delay
Time
M-S. Lee, Samsung SDI, Kyunggi-do, Korea |
|
32.2: |
MgO Protective Layer Using Single-Crystal
Nano-Powders in ACPDPs
Y-S. Kim, LG Electronics, Inc., Seoul, Korea |
|
32.3: |
Distinguished
Paper: High-Efficiency Hybrid PDP
J-H. Park, Hongik University, Seoul, Korea |
|
32.4: |
Influence of H2 Addition to Xe-Ne Gas Mixtures for Voltage Lowering
in ACPDPs
T. Okada, Pioneer Corp., Yamanashi, Japan |
|
32.5L: |
Late-News Paper: Exoelectron Emission from MgO and
Ultra-High-Contrast Drive of PDPs
T. Shiga, The University of Electro-Communications, Tokyo, Japan
|
| Session 33:
TFT Processing & Devices |
|
Wednesday, May 25 / 5:10 - 6:40 pm / Ballroom A |
|
33.1: |
A 3.2-in. LCD Panel Using a-Si TFT Formed with a Novel Selective and
Dispersive Transfer Technique
Y. Onozuka, Toshiba Corp., Kawasaki, Japan |
|
33.2: |
Investigation of the Fin-Like TFT Structure in LTPS Devices
H. Yin, Samsung Advanced Institute of Technology, Suwon, Korea |
|
33.3: |
Source-Gated Transistors in a-Si for Active-Matrix Displays
F. Balon, University of Surrey, Guildford, UK |
|
33.4: |
Distinguished
Paper: An LTPS Active-Matrix Process without Ion Doping
H. Baur, University of Stuttgart, Stuttgart, Germany
|
| Session 34:
OLED Displays II |
|
Wednesday, May 25 / 5:10 - 6:50 pm / Ballroom C |
|
34.1: |
Ultra-Thin Encapsulation for Large-Area OLED Displays
J. J . W. M. Rosink, Philips Research Laboratories, Eindhoven, The
Netherlands |
|
34.2: |
Optical Simulation of OLED Devices and Its Application for
Determination of Emitting Zone
H. Kuma, Idemitsu Kosan Co., Ltd., Chiba, Japan |
|
34.3: |
High-Resolution Full-Color Polymer Light-Emitting Devices Using
Photolithography
T. Tachikawa, Dai Nippon Printing Co., Kashiwa, Japan |
|
34.4L: |
Late-News Paper: Light Out-Coupling Enhancement of OLEDs by
Polarized Light Recycling Structure
M. Adachi, Hitachi, Ltd., Ibaraki, Japan
|
| Session 35:
Fringe-Field Effects in Microdisplays |
|
Wednesday, May 25 / 5:10 - 6:40 pm / Room 302 |
|
35.1: |
Eliminating Fringe-Field Effects of Vertically Alligned LCoS by
Using Circularly Polarized Light
K-H. F. Chiang, National Chiao Tung University, Hsinchu, Taiwan, R.O.C. |
|
35.2: |
Improvement on Fringe Field in VA-Mode LCoS Panels
J. Peng, Taiwan Micro Display Corp., Hsinchu, Taiwan, R.O.C. |
|
35.3: |
Fringe Fields in Advanced High-Pixel-Count VAN LCoS Devices
D. Cuypers, TFCG / IMEC, Ghent, Belgium |
|
35.4: |
Three-Dimensional Optical Analyses of Fringe-Field Effects in Small
Color Pixels
B. Zhang, The Hong Kong University of Science & Technology, Clear
Water Bay, Hong Kong
|
| Session 36:
Backlights II |
|
Wednesday, May 25 / 5:10 - 6:40 pm / Room 304 |
|
36.1: |
High-Efficiency Mercury-Free Flat Light Source for LCD Backlighting
J. K. Lee, Seoul National University, Seoul, Korea |
|
36.2: |
The
Lifetime and Pinholes in the External Electrode Fluorescent
Lamps
D.H. Gil, Kwangwoon University, Seoul, Korea |
|
36.3L: |
Late-News Paper:
Spatio-Temporal Scanning Backlight for
Color-Field-Sequential OCB-Mode LCD
K. Käläntär, Nippon Leiz Corp., Tokyo, Japan
|
| 36.4: |
Design of a Highly Uniform LED Backlight
S. Lim, Dankook University, Cheonan, Korea
|
| Session 37:
Display Measurements |
|
Wednesday, May 25 / 5:10 - 6:40 pm / Room 312 |
|
37.1: |
Estimating Display Modulation by 2-D Fourier Transform: A Preferred
Method
T. Fiske, Rockwell Collins - San Jose, San Jose, CA, USA |
|
37.2: |
Performance Limitations with QWP Reference Targets for
Reflective-LCD Measurements
L. Collier, DisplayCheck, Exeter, RI, USA |
|
37.3: |
WITHDRAWN |
|
37.4: |
Production-Line Characteristics of LC Cells
S. Valyukh, Swedish LCD Center, Borlange, Sweden
|
| Session 38:
AMOLEDs I |
|
Thursday, May 26 / 9:00 - 10:20 am / Ballroom A |
|
38.1: |
Optical Feedback for AMOLED Display Compensation Using LTPS ans a-Si:H
Technologies
D. Fish, Philips Research Laboratories, Redhill, UK |
|
38.2: |
A 302-ppi High-Resolution AMOLED Using Laser-Induced Thermal Imaging
K-J. Yoo, Samsung SDI, Yongin, Korea |
|
38.3: |
LTPS AMOLED Displays Incorporating High-Contrast Top-Emitting OLEDs
Y-H. Yeh, ERSO/ITRI, Chutung, Taiwan, R.O.C. |
|
38.4: |
A 6-bit AMOLED with RGB Adjustable-Gamma-Compensation LTPS TFT
Circuit
Y. Matsueda, Samsung SDI, Yongin, Korea
|
| Session 39:
LCoS Projection |
|
Thursday, May 26 / 9:00 - 10:20 am / Room 302 |
|
39.1: |
Invited Paper:
Why Analog Silicon May Be Best for LCoS Digital TV
M. L. Jepsen, Consultant, Sausalito, CA, USA |
|
39.2: |
Silicon X-tal Reflective Display (SXRD): A New Display Device for
Projection Displays
S. Hashimoto, Sony Corp., Kanagawa, Japan |
|
39.3: |
Fast VAN LCoS Microdisplay
J. Anderson, Hana Microdisplay Technologies, Inc., Twinsburg, OH, USA |
|
39.4: |
Fast-Switching VA-Mode LCoS for Single-Panel Application
E. Liao, Taiwan Microdisplay Corp., Chuman, Taiwan, R.O.C.
|
| Session 40:
LED Backlights |
|
Thursday, May 26 / 9:00 - 10:20 / Room 304 |
|
40.1: |
Distinguished
Paper: Integrated a-Si Color Sensor on LCD Panel for LED Backlight System
K-C. Lee, Samsung Electronics, Co., Ltd., Kyunggi-do, Korea |
|
40.2: |
RGB Color Control System for LED Backlights in
IPS-LCD TVs
A. Konno, Hitachi Materials Research Laboratory, Ibarakii, Japan |
|
40.3: |
Power Minimization of LED Backlight in a Color-Sequential Display
W. C. Cheng, University of Southern California, Rosemead, CA, USA |
|
40.4: |
Design and Analysis of Tapered Waveguides as Collimators for LED
Backlighting
D. Nesterenko, Samsung Advanced Institute of Technology, Yongin, Korea
|
| Session 41:
Attention and Data Visualization |
|
Thursday, May 26 / 9:00 - 10:20 am / Room 311 |
|
41.1: |
Invited Paper:
How Might the Rules that Govern Visual Search
Constrain the Design of Visual Displays?
J. Wolfe, Harvard Medical School, Cambridge, MA, USA |
|
41.2: |
The Effect of Edge Filtering on Vision Multiplexing
H. Apfelbaum, Schepens Eye Research Institute, Boston, MA, USA |
|
41.3: |
Invited Paper: High-Dynamic-Range Displays for High-Fidelity
Archaeological Site Reconstruction
A. Chalmers, University of Bristol, Bristol, UK |
|
41.4: |
Meta-Information Visualization in Geographic Information Systems
J. Pfautz, Charles River Analytics, Inc., Cambridge, MA, USA
|
| Session 42:
Display Phosphors |
|
Thursday, May 26 / 9:00 - 10:20 am / Room 312 |
|
42.1: |
Invited Paper: Nanophosphors for Display Applications
A. Vecht, Aron Vecht and Associates, London, UK |
|
42.2: |
Invited Paper: Influence of Lanthanide Level Location on the
Performance of Phosphors
P. Dorenbos, Delft University of Technology, Delft, The Netherlands |
|
42.3: |
Wavelength Tunable Emission from II-VI Phosphors Excited by Electron
Beams or UV Light for Display Applications
R. Withnall, University of Greenwich, Kent, UK |
|
42.4: |
Enhanced Photoluminescence of (Y,A)V(O,S)4:Eu3+ (A = Sr, Ba)
Compared with YVO4:Eu3+
S. I. Mho, Ajou University, Suwon, Korea
|
| Session 43:
System on Glass |
|
Thursday, May 26 / 10:40 am - 12:00 pm / Ballroom A |
|
43.1: |
A Flexible 8-bit Asynchronous Microprocessor Based on LTPS TFT
Technology
N. Karaki, Seiko-Epson Corp., Suwa, Japan |
|
43.2: |
Invited Paper: Low-Power System-on-Glass LCD Technologies
H. Asada, NEC Corp., Sagamihara, Japan |
|
43.3: |
Integration of Reliability with High-Current Drivability by Using
SELAX Technology for High-Resolution (>300 ppi) System-in-Displays
Y. Toyota, Hitachi Central Research Laboratory, Tokyo, Japan |
|
43.4: |
A Novel Integrated dc-dc Converter Using LTPS TFTs
S-H. Yeh, AU Optronics Corp, Hsinchu, Taiwan, R.O.C.
|
| Session 44:
Polysilicon Integration for AMOLEDs |
|
Thursday, May 26 / 10:40 - 11:50 am / Ballroom C |
|
44.1: |
A 1.8-in. QVGA AMOLED Display with New Driving Method and Ultra-Slim
Technology
W. K. Kwak, Samsung SDI ,Yongin, Korea |
|
44.2: |
New Driving Method with Current-Subtraction Pixel Circuit for AMOLED
Displays
J. Yamashita, Sony Micro Systems Network Co., Kanagawa, Japan |
|
44.3: |
High-Aperture-Ratio AMOLED Pixel Design Employing VDD Line
Elimination for Reducing OLED Current Density
W-J. Nam, Seoul National University, Seoul, Korea |
|
44.4L: |
Late-News Paper:
A Color Balance Control System for OLED Displays
with Clamped Inverter Method
N. Kasai, Hitachi Ltd., Kanagawa, Japan
|
| Session 45:
LC Materials and Components |
|
Thursday, May 26 / 10:40 - 11:50 am / Room 302 |
|
45.1: |
High-Contrast Homeotropic Alignment of Difluoro-Tolane Liquid
Crystals
C.-H. Wen, University of Central Florida, Orlando, FL, USA |
|
45.2: |
Electro-Optics of Liquid Crystals Doped with Ferroelectric
Nano-Powder
C. I. Cheon, Liquid Crystal Institute, Kent State University, Kent, OH,
USA |
|
45.3: |
Compensated TN-LCD with Color Perfection Film
M. Paukshto, Optiva, Inc., South San Francisco, CA, USA |
|
45.4L: |
Late-News Paper: Retardation Film Made of Polymerisable Liquid
Crystal without Rubbing
T. Kuroda, Dai Nippon Printing Co., Ltd., Chiba, Japan
|
| Session 46:
Video Processing & Overdrive Technology |
|
Thursday, May 26 / 10:40 am - 12:00 pm / Room 304 |
|
46.1: |
Adaptive Video Converters: A New Family of Video Conversion ICs for
High-Definition A/V Systems
N. Balram, National Semiconductor Corp., Santa Clara, CA, USA |
|
46.2: |
LifePix Image-Enhancement Features for Mobile Displays
P. de Greef, Philips Semiconductors, Eindhoven, The Netherlands |
|
46.3: |
Software-Processed Edge- and Level-Adaptive Overdrive
(SELAO) Method
for High-Quality Motion Pictures
M. Baba, Toshiba Corp., Kawasaki, Japan |
|
46.4: |
Improved Technology for Motion-Artifact Elimination in LCD Monitors:
Advanced DCC
S. W. Lee, Samsung Electronics, Yongin, Korea
|
| Session 47:
Human Factors and Projection Displays |
|
Thursday, May 26 / 10:40 am - 12:00 pm / Room 311 |
|
47.1: |
Invited Paper:
Image-Quality Comparison of
PDPs, LCDs, CRTs, and
LCoS Projection Displays
I. Heynderickx, Philips Resarch Laboratories, Eindhoven, The Netherlands |
|
47.2: |
Luminance Management for Seamless Multi-Projector Displays
A. Majumder, University of California at Irvine, Irvine, CA, USA |
|
47.3: |
Suppression of Color Breakup in Color-Sequential Multi-Primary
Projection Displays
D. Eliav, Genoa Color Technologies, Inc., Herzelia, Israel |
|
47.4: |
Invited Paper:
Wobulation Doubling the Resolution of Projection
Displays
W. Allen and R. Ulichney, Hewlett-Packard Co., Corvallis, OR,
USA
|
| Session 48:
Color CRTs |
|
Thursday, May 26 / 10:40 - 12:00 pm / Room 312 |
|
48.1: |
Distinguished
Paper: Development of a 32-in. Wide-Deflection-Angle CRT (125°)
S-C. Shin, Samsung SDI, Ulsan, Korea |
|
48.2: |
New Thermal Compensation System for a Tension-Mask CRT
K. Ha, Samsung SDI, Ulsan, Korea |
|
48.3: |
Finite-Element Modeling Technique and Optimal Bead Design of Frame
in CRTs
H-S. Oh, Samsung SDI, Suwon, Korea |
|
48.4: |
Development of High-Contrast CRT Based on Nano Pigment Screen
Technique
M-S. Kim, Samsung SDI, Co., Ltd., Ulsan, Korea
|
| Session 49:
AMOLEDs II |
|
Thursday, May 26 / 2:00 - 3:20 pm / Ballroom A |
|
49.1: |
A 14.1-in. Full-Color AMOLED Display with a Top-Emission Structure
and a-Si TFT Backplane
J-H. Jung, Samsung Electronics, Kyunggi-do, Korea |
|
49.2: |
A 2-in. AMOLED with a-Si:H TFT Using PVP Gate Insulator on Plastic
Substrates
J. H. Jung, Kyung Hee University, Seoul, Korea |
|
49.3: |
A 200-dpi Transparent a-Si TFT Active-Matrix Phosphorescent OLED
Display
Y-J. Tung, Universal Display Corp., Ewing, NJ, USA |
|
49.4: |
Two-TFT Pixel Circuit with Non-Uniformity Suppress Function for
Voltage Programming AMOLED Displays
H. Akimoto, Hitachi, Ltd., Tokyo, Japan
|
| Session 50:
Flexible
Displays |
|
Thursday, May 26 / 2:00 - 3:30 pm / Room 302 |
|
50.1: |
Distinguished
Paper: Single-Substrate Encapsulated Cholesteric LCDs: Coatable, Drapable,
and Foldable
I. Shiyanovskaya, Kent Displays, Inc., Kent, OH, USA |
|
50.2: |
Cholesteric Liquid-Crystal Micro-Capsules with a Perpendicular
Alignment Shell for Photo-Addressable Electronic Paper
N. Hiji, Fuji Xerox Co., Kanagawa, Japan |
|
50.3: |
Electro-Optical Performance of Bending Ultra-Flexible Film-like
Display
Y-R. Lin, ERSO/ITRI, Hsinchu,Taiwan, R.O.C. |
|
50.4: |
Flexible Encapsulated Cholesteric LCDs by Polymerization-Induced
Phase Separation
T. Schneider, Kent Displays, Inc., Kent, OH, USA |
|
50.5L: |
Column Spacers on a High-Resolution Flexible Color Filter for LCDs
Using a Roll-to-Roll Process
A. Sonehara, Technology Research Association for Advanced Display
Materials (TRADIM), Tokyo, Japan
|
| Session 51:
Motion-Blur Analysis and Reduction |
|
Thursday, May 26 / 2:00 - 3:20 pm / Room 304 |
|
51.1: |
Temporal Impulse Response and Bandwidth of Displays in Relation to
Motion Blur
M. Klompenhouwer, Philips Research Laboratories, Eindhoven, The
Netherlands |
|
51.2: |
Mastering the Moving Image: Refreshing TFT-LCDs at 120 Hz
B-W. Lee, Samsung Electronics, Yongin, Korea |
|
51.3: |
Motion-Adaptive Edge Compensation to Decrease Motion Blur of
Hold-Type Display
T. Kurita, NHK Science & Technical Research Labs, Tokyo, Japan |
|
51.4: |
Quantitative Analysis of LCD Motion Blur and Performance of Existing
Approaches
H. Pan, Sharp Laboratories of America, Camas, WA, USA
|
| Session 52:
Projection Illumination I |
|
Thursday, May 26 / 2:00 - 3:20 pm / Room 311 |
|
52.1: |
A New Driving Scheme for AC-Type Ultra-High-Pressure Mercury Lamp
with Highly Stabilized Light Output
K. Sugaya, Ushio, Inc., Hyogo, Japan |
|
52.2: |
Long-Lifetime UHP Lamps for Consumer Applications
H. Moench, Philips Research Laboratories, Aachen, Germany |
|
52.3: |
High-Power InGaN Blue Laser Diodes for Displays
T. Kozaki, Nichia Corp., Tokushima, Japan |
|
52.4: |
High-Speed Green-Frequency-Converted Semiconductor Laser for
Projection Displays
U. Steegmuller, OSRAM Opto Semiconductors GmbH, Regensburg, Germany
|
| Session 53:
Carbon-Nanotube Emitters |
|
Thursday, May 26 / 2:00 - 3:20 pm / Room 312 |
|
53.1: |
Fabrication of CNT Emitter Array with Polymer Insulator
K. Nishimura, Mitsubishi Electric Co., Hyogo, Japan |
|
53.2: |
Characteristics of Field Emission from Printed Carbon Nanotubes by
Physical Surface Treatments
Y-D. Lee, KIST, Seoul, Korea |
|
53.3: |
Invited Paper: CNT FEDs for Large-Area and HDTV Applications
E. J. Chi, Samsung SDI, Yongin, Korea |
|
53.4: |
A New Coated CNT Cathode Using an ITO Ink
M. Muroyama, Sony Corp., Kanagawa, Japan
|
| Session 54:
Flexible Ultra-Low-Power Displays |
|
Thursday, May 26 / 3:40 - 5:00 pm / Ballroom A |
|
54.1: |
Flexible Electrophoretic Displays with Ink-Jet-Printed Active-Matrix
Backplanes
J. Daniel, Palo Alto Reseach Center, Palo Alto, CA, USA |
|
54.2: |
Thin Plastic Electrophoretic Displays Fabricated by a Novel Process
I. French, Philips Research Laboratory, Redhill, UK |
|
54.3: |
A Flexible 2-in. QVGA LTPS-TFT Electrophoretic Display
H. Kawai, Seiko-Epson Corp., Suwa, Japan |
|
54.4: |
A 4.1-in. Top-Emission AMOLED on Flexible Metal Foil
H. S. Shin, Samsung SDI, Kyunggi-do, Korea
|
| Session 55:
OLED Materials I |
|
Thursday, May 26 / 3:40 - 5:00 pm / Ballroom C |
|
55.1: |
Invited Paper: The Isomerism of the Alq3 Molecule: Evidence from
Structural, Thermal, and Photophysical Investigations
M. Cölle, University of Bayreuth, Augsburg, Germany |
|
55.2: |
Bipyridyl Oxadiazoles as a New Class of Durable and Eficient
Electron-Transporting Materials
M. Ichikawa, Shinshu University, Nagano, Japan |
|
55.3: |
Development of Novel Wet-Type Buffer Materials for OLEDs
G. Ono, Nissan Chemical Industries, Ltd., Chiba, Japan |
|
55.4: |
A Novel Hole-Injection Layer with the Ability of Forming
Hydrophobic-Hydrophilic Patterns
Y. Iizumi, Dai Nippon Printing Co., Ltd., Chiba, Japan
|
| Session 56:
Other Non-Emissive Displays |
|
Thursday, May 26 / 3:40 - 5:00 pm / Room 302 |
|
56.1: |
Invited Paper: High-Quality Images on Electronic-Ink Displays
M. Johnson, Philips Research Laboratories, Eindhoven, The Netherlands |
|
56.2: |
Computational Modeling of Pigment Dispersions in Electrophoretic
Displays
H. Kodama, Mitsubishi Chemical Group, Aoba, Japan |
|
56.3: |
Electrowetting Light Valves with Greater than 80% Transmission,
Unlimited Viewing Angle, and Video Response
J. Heikenfeld, Extreme Photonix LLC, Cincinnati, OH, USA |
|
56.4: |
WITHDRAWN
|
| Session 57:
Interface Technology |
|
Thursday, May 26 / 3:40 - 4:40 pm / Room 304 |
|
57.1: |
Invited Paper:
Advanced Bus System Interface (ABSI) LCD Module
B. Berkeley, Samsung Electronics, Kyunggi-do, Korea |
|
57.2: |
A New Interface WiseBus for Large-LCD-TV Applications
I. K. Chang, Samsung Electronics, Kyunggi-do, Korea |
|
57.3: |
Evaluation Results of LCD Panels Using Point-to-Point Differential
Signaling Architecture
R. McCartney, National Semiconductor Corp., Santa Clara, CA, USA
|
| Session 58:
Projection Illumination II |
|
Thursday, May 26 / 3:40 - 5:00 pm / Room 311 |
|
58.1: |
Single-Panel LCoS Color Projector with LED Light Sources
H. Zou, Philips Research, Briarcliff Manor, NY, USA |
| 58.2: |
WITHDRAWN |
|
58.3: |
A New LED Light Source for Projection Applications
S. Groetsch, OSRAM Opto Semiconductors, Regensburg, Germany |
|
58.4: |
A Handheld Mini-Projector Using LED Light Sources
B. Salters, Philips Research Laboratories, Eindhoven, The
Netherlands
|
| Session 59:
FED Panels I |
|
Thursday, May 26 / 3:40 - 5:00 pm / Room 312 |
|
59.1: |
Invited Paper: National FED Project in Japan
S. Okuda, Mitsubishi Electric Corp., Hyogo, Japan |
|
59.2: |
Invited Paper:
Development of CNT-FED by Printing Method
C-C. Lee, ERSO/ITRI, Hsinchu, Taiwan, R.O.C. |
|
59.3: |
High-Resolution CNT-FED for Graphics Displays
J. Yotani, Noritake Co.,Ltd., Mie, Japan |
|
59.4: |
Novel Device Structure of Field-Effect Ferroelectric Electron
Emitter
I. Ohwada, NGK Insulators, Ltd., Nagoya, Japan
|
|